The on-line multicomponent capability of Gasmet™ analyzers provides true advantages for process control applications. Various chemical processes can be effectively monitored and controlled with Gasmet™ FTIR gas analyzers. The wide measurement ranges (from ppb to high volume-%) combined with very fast response times provide an optimum solution for process monitoring & control.

With traditional analyzers such as NDIR, cross-interference can pose a problem especially in complex gas matrices. With Gasmet™ FTIR, cross-interference is compensated for in the multicomponent analysis of measured sample gas spectra. Also, it’s possible to identify previously unknown compounds from the sample thanks to the molecular “fingerprint” that is recorded in the sample spectrum.

Gasmet™ FTIR gas analyzers are manufactured and calibrated to meet the requirements of the specific measurement application. Sampling units are also made to required specification: both heated and unheated sampling units are available, in single and multipoint configuration.

For example, even high concentrations (percentage level) of Nitrogen Monoxide can be accurately monitored with Gasmet™ FTIR analyzers.

In the manufacturing process of semiconductors, many hazardous chemicals are used. Gasmet™ FTIR gas analyzers are well suited for gas monitoring in semiconductor manufacturing, since up to 50 different gases can be measured simultaneously (both organic & inorganic).

Determining the exact concentration of Nitrous Oxide (N2O) can be extremely useful in control of many processes, such as production of fertilizers. With Gasmet™ FTIR, N2O measurements can be made reliably in the presence of high concentrations of H2O, NO2, NO and NH3.

For more information on above mentioned process monitoring applications, please see the applications notes on the right.